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We report the first study on a GaAs/GaAsSb core−shell (CS)-configured nanowire (NW)-based separate absorption, charge control, and multiplication region avalanche photodiode (APD) operating in the near-infrared (NIR) region. Heterostructure NWs consisted of GaAs and tunable band gap GaAs1−xSbx serving as the multiplication and absorption layers, respectively. A doping compensation of absorber material to boost material absorption, segment-wise annealing to suppress trap-assisted tunneling, and an intrinsic i-type and n-type combination of the hybrid axial core to suppress axial electric field are successfully adopted in this work to realize a room-temperature (RT) avalanche photodetection extending up to 1.3 μm. In an APD device operating at RT with a unity-gain responsivity of 0.2−0.25 A/W at ∼5 V, the peak gain of 160 @ 1064 nm and 18 V reverse bias, gain >50 @ 1.3 μm, are demonstrated. Thus, this work provides a foundation and prospects for exploiting greater freedom in NW photodiode design using hybrid axial and CS heterostructures. 

We report the first study on doping assessment in Te-doped GaAsSb nanowires (NWs) with variation in Gallium Telluride (GaTe) cell temperature, using X-ray photoelectron spectroscopy (XPS), ultraviolet photoelectron spectroscopy (UPS), conductive-atomic force microscopy (C-AFM), and scanning Kelvin probe microscopy (SKPM). The NWs were grown using Ga-assisted molecular beam epitaxy with a GaTe captive source as the dopant cell. Te-incorporation in the NWs was associated with a positive shift in the binding energy of the 3d shells of the core constituent elements in doped NWs in the XPS spectra, a lowering of the work function in doped NWs relative to undoped ones from UPS spectra, a significantly higher photoresponse in C-AFM and an increase in surface potential of doped NWs observed in SKPM relative to undoped ones. The carrier concentration of Te-doped GaAsSb NWs determined from UPS spectra are found to be consistent with the values obtained from simulated I-V characteristics. Thus, these surface analytical tools, XPS/UPS and C-AFM/SKPM, that do not require any sample preparation are found to be powerful characterization techniques to analyze the dopant incorporation and carrier density in homogeneously doped NWs. 

This work reports a comprehensive investigation of the effect of gallium telluride (GaTe) cell temperature variation (TGaTe) on the morphological, optical, and electrical properties of doped-GaAsSb nanowires (NWs) grown by Ga-assisted molecular beam epitaxy (MBE). These studies led to an optimum doping temperature of 550 °C for the growth of tellurium (Te)-doped GaAsSb NWs with the best optoelectronic and structural properties. Te incorporation resulted in a decrease in the aspect ratio of the NWs causing an increase in the Raman LO/TO vibrational mode intensity ratio, large PL emission with an exponential decay tail on the high energy side, promoting tunnel-assisted current conduction in ensemble NWs and significant photocurrent enhancement in the single nanowire. A Schottky barrier photodetector using Te-doped ensemble NWs with broad spectral range and a longer wavelength cutoff at ~ 1.2 µm was demonstrated. These photodetectors exhibited responsivity in the range of 580 – 620 A/W and detectivity of 1.2 – 3.8 × 1012 Jones. The doped GaAsSb NWs have the potential for further improvement, paving the path for high-performance near-infrared (NIR) photodetection applications.